AlGaN/GaN high electron mobility transistors (HEMTs) are a key enabling technology for future power conditioning applications in the low carbon economy, and for high efficiency military and civilian microwave systems. GaN-on-Si is highly attractive as a low cost, medium performance technology platform which has been proved to be usable even up to the W-band. The main down-sides of Si are the low bandgap and hence resistive lossy substrate especially at modest elevated temperatures, the vulnerability of the Si to unintentional doping with gallium during epitaxy causing RF losses, and the somewhat restricted power handling resulting from the relatively low thermal conductivity of the Si compared to the 4" SiC growth substrates currently used. However the cost benefits are dramatic allowing 6" or even 8" high volume wafer processing. 6" GaN-on-Si epitaxy is already available driven by the emerging GaN-on-Si power switch market, however it is optimised for high voltage, switched-mode operation. Improved RF power amplifier (PA) efficiency using GaN-on-Si, which is the focus of this proposal, would reduce the transistor temperature rise, reduce the substrate losses and deliver a low-cost high-performance technology as it would reduce the transistor temperature rise and reduce the substrate losses. The advance that is required is an optimised RF specific GaN-on-Si transistor architecture, which requires detailed understanding of electronic traps introduced into the GaN buffer of these devices by iron, carbon and carbon/iron co-doping, which is presently lacking. The key aim of this proposal is to control and model the device capacitances and conductances using novel epitaxial design of the GaN buffer, as this is key to delivering improved efficiency, gain and linearity in RF amplifiers.

AlGaN/GaN high electron mobility transistors (HEMTs) are a transformative technology for high-power density radio frequency applications, including radar, satellite and mobile communications. In addition, efficient power conversion systems based on GaN devices are a key enabling technology for the low carbon economy, including renewable energy generation and transport electrification. However, their full potential has not yet been realised because performance is de-rated to ensure stable long-term device operation. Experimental characterisation of the electric field distribution in these devices has been lacking, despite being identified as a primary driver of degradation phenomena including breakdown, charge trapping and self-heating. These processes occur in and around the device channel and particularly the sub-micron region under the gate and field plate where peak electric fields are located. The aim of this proposal is a step-change in electric field imaging of semiconductor devices, by developing an optical three dimensional (3-D) device analysis technique with nanometre-scale spatial resolution. The primary focus will be on electric field induced second harmonic generation (EFISHG) combined with solid immersion lenses (SILs). This will enable us to investigate key performance and reliability challenges including (i) the effect of buffer doping on the dynamic distribution of charge in the device layers which causes an undesirable memory effect, (ii) optimization of field plate geometry to manage peak electric fields, (iii) comparing electric field distributions during RF and DC operation to improve reliability forecasts. These are on the critical pathway to achieving a high performance reliable GaN HEMT device technology which exploits the full benefits of the material properties of GaN.

Global demand for high power microwave electronic devices that can deliver power densities well exceeding current technology is increasing. In particular Gallium Nitride (GaN) based high electron mobility transistors (HEMTs) are a key enabling technology for high-efficiency military and civilian microwave systems, and increasingly for power conditioning applications in the low carbon economy. This material and device system well exceeds the performance permitted by the existing Si LDMOS, GaAs PHEMT or HBT technologies. GaN-based HEMTs have reached RF power levels up to 40 W/mm, and at frequencies exceeding 300 GHz, i.e., a spectacular performance enabling disruptive changes for many system applications. However, transistor reliability is driven by electric field and channel temperature, so self-heating means in practice that reliable devices can only be operated up to RF power densities of 10 W/mm in contrast to the 40 W/mm hero data published in the literature. Considerable concern also exists in the UK and across Europe that access to state-of-the-art GaN microwave technology is limited by US ITAR (International Traffic in Arms Regulation) restrictions. The most advanced capabilities for all elements of GaN HEMT technology, using traditional SiC substrates, epitaxy and device processing currently reside in the US, with restricted access by UK industry. The vision of Integrated GaN-Diamond Microwave Electronics: From Materials, Transistors to MMICs (GaN-DaME) is to develop transformative GaN-on-Diamond HEMTs and MMICs, the technology step beyond GaN-on-SiC, which will revolutionize the thermal management which presently limits GaN electronics. Challenges occur in terms of how to integrate such dissimilar materials into a reliable device technology. The outcome will be devices with a >5x increase in RF power compared to GaN-on-SiC, or alternatively and equally valuably, a dramatic 'step-change' shrinkage in MMIC or PA size, and hence an increase in efficiency through the removal of lossy combining networks as well as a reduction in power amplifier (PA) cost. This represents a disruptive change in capability that will allow the realisation of new system architectures e.g. for RF seekers and medical applications, and enable the bandwidths needed to deliver 5G and beyond. Reduced requirements for cooling / increased reliability will result in major cost savings at the system level. To enable our vision to become reality, we will develop new diamond growth approaches that maximize diamond thermal conductivity close to the active GaN device area. In present GaN-on-Diamond devices a thin dielectric layer is required on the GaN surface to enable seeding and successful deposition of diamond onto the GaN. Unfortunately, most of the thermal barrier in these devices then exists at this GaN-dielectric-diamond interface, which has much poorer thermal conductivity than desired. Any reduction in this thermal resistance, either by removing the need for a dielectric seeding layer for diamond growth, or by optimizing the grain structure of the diamond near the seeding, would be of huge benefit. Novel diamond growth will be combined with innovative micro-fluidics using phase-change materials, a dramatically more powerful approach than conventional micro-fluidics, to further aid heat extraction. An undiscussed consequence of using diamond, its low dielectric constant, which poses challenges and opportunities for microwave design will be exploited. At the most basic level, the reliability of this technology is not known. For instance, at the materials level the diamond and GaN have very different coefficients of thermal expansion (CTE). Mechanically rigid interfaces will need to be developed including interdigitated GaN-diamond interfaces.

Future generation (5G) mobile phones and other portable devices will need to transfer data at a much higher rate than at present in order to accommodate an increase in the number of users, the employment of multi-band and multi-channel operation, the projected dramatic increase in wireless information exchange such as with high definition video and the large increase in connectivity where many devices will be connected to other devices (called "The Internet of Things"). This places big challenges on the performance of base stations in terms of fidelity of the signal and improved energy efficiency since energy usage could increase in line with the amount of data transfer. To meet the predicted massive increase in capacity there will be a reduced reliance on large coverage base-stations, with small-cell base-stations (operating at lower power levels) becoming much more common. In addition to the challenges mentioned above, small cells will demand a larger number of low cost systems. To meet these challenges this proposal aims to use electronic devices made from gallium nitride (GaN) which has the desirable property of being able to operate at very high frequencies (for high data transfer rates) and in a very efficient manner to reduce the projected energy usage. To maintain the high frequency capability of these devices, circuits will be integrated into a single circuit to reduce the slowing effects of stray inductances and capacitances. Additionally these integrated circuits will be manufactured on large area silicon substrates which will reduce the system unit cost significantly. The proposed high levels of integration using GaN devices as the basic building block and combining microwave and switching technologies have never been attempted before and requires a multi-disciplinary team with complementary specialist expertise. The proposed consortium brings together the leading UK groups with expertise in GaN crystal growth (Cambridge), device design and fabrication (Sheffield), high frequency circuit design and fabrication (Glasgow), variable power supply design (Manchester) and high frequency characterisation and power amplifier design (Cardiff). Before designing and developing the technology for fabricating the integrated systems to demonstrate the viability of the proposed solutions, a deep scientific understanding is required into how the quality of the GaN crystals on silicon substrates affect the operation of the devices. In summary, the powerful grouping within the project will bring together the expertise to design and produce the novel integrated circuits and systems to meet the demanding objectives of this research proposal.

We will establish the primary global manufacturing research hub for Compound Semiconductors that brings together Academic and Industrial researchers. This will capitalize on existing academic expertise in Cardiff, Manchester, Sheffield and UCL and the UK indigenous corporate strength in the key advanced materials technology of Compound Semiconductors. Cardiff, the Compound Semiconductor Centre and the other spoke universities will provide > £100M of additive capital leverage to the Hub, providing European leading facilities for large scale compound semiconductor epitaxial growth, device fabrication and characterisation enabling the most effective translation of research to manufacturing. The hub will operate at the necessary scale and with the necessary reach to change the approach of the UK compound semiconductor research community to one focused on starting from research solutions that can be manufactured. It will do this by providing the necessary tools and expertise and will become the missing exploitation link for the UK compound semiconductor research community. It will be a magnet and the driver for high technology industry and will act as the focal point for Europe's 5th Semiconductor Cluster and the 1st dedicated to compound semiconductors. Partners will include local and UK companies and global organisations. The importance of compound semiconductor technology cannot be overstated. It has underpinned the internet and enabled megatrends such as Smart Phones and Tablets, satellite communications / GPS, Direct Broadcast TV, energy efficient LED lighting, efficient solar power generation, high capacity communication networks, data storage, ground breaking healthcare and biotechnology. Silicon has supported the information society in the 20th century and dominates memory and processor function, but is reaching fundamental limits. Whilst the combination of Silicon and compound semiconductors will produce a second revolution in the information age, they are very different materials with, for example, different fundamental lattice constants and different thermal properties and have different device fabrication requirements. We propose research into large scale Compound Semiconductor manufacturing and in manufacturing integrated Compound Semiconductors on Silicon. The scale of the hub means we can bring together three world leading researchers in the growth of compound semiconductors on Silicon. Each has individually invented different solutions to tackle the silicon / compound semiconductor interface - together they will invent the universal solution. We will solve the scientific challenges in wafer size scale-up, process statistical control and integrated epitaxial growth and processing to facilitate new devices and integrated systems and open up completely new areas of research, only possible with reliable and reproducible fabrication, such as electronically controlled Qubits. We will facilitate the improved communication infrastructure necessary for the connected world and the integrated systems of the Internet of Things. We will produce large area integrated sensor arrays for, e.g. in-process Non-Destructive Testing, further benefiting manufacturing but also improving our safety and security. The key outcomes will be to 1) To radically boost the uptake and application of Compound Semiconductor technology by applying the manufacturing approaches of Silicon to Compound Semiconductors, 2) To exploit the highly advantageous electronic, magnetic, optical and power handling properties of Compound Semiconductors while utilising the cost and scaling advantage of silicon technology where best suited and 3) To generate novel integrated functionality such as sensing, data processing and communication.