
FNSR
5 Projects, page 1 of 1
Open Access Mandate for Publications assignment_turned_in Project2020 - 2023Partners:FOUNDATION FOR RESEARCH AND TECHNOLOGYHELLAS, Bundeswehr University Munich, 3SUN S.R.L., UNIPD, University of Regensburg +190 partnersFOUNDATION FOR RESEARCH AND TECHNOLOGYHELLAS,Bundeswehr University Munich,3SUN S.R.L.,UNIPD,University of Regensburg,IDIBAPS,CIC ENERGIGUNE,University of Bremen,UNIVERSITE DE LILLE,CSIC,G.TEC MEDICAL ENGINEERING GMBH,IHP GMBH,BSL,SIXONIA TECH,TUW,NSN,HEIDELBERG MATERIALS ITALIA CEMENTI SPA,University of Nottingham,CNRS,CIBER,UNISA,ProGnomics Ltd.,Emberion Ltd,EAB,PIXIUM VISION,Polytechnic University of Milan,Trinity College Dublin, Ireland,SUSS MicroTec Lithography GmbH,Chalmers University of Technology,NanOsc AB,AMO GMBH,DI,LNE,TU Delft,UCL,BEDIMENSIONAL SPA,TEKNOLOGIAN TUTKIMUSKESKUS VTT OY,CAU,Varta Microbattery (Germany),Evonik Nutrition & Care GmbH,GRUPO ANTOLIN-INGENIERIA SA,MAGNA ELECTRONICS SWEDEN AB,MCS,Infineon Technologies (Germany),HUN-REN CENTRE FOR ENERGY RESEARCH,AIRBUS OPERATIONS SL,M-Solv,University of Sheffield,MPG,STMicroelectronics (Switzerland),BMW Group (Germany),INSTITUTO NACIONAL DE INVESTIGACION Y TECNOLOGIA AGRARIA Y ALIMENTARIA OA MP,UCLM,ABB AB,INBRAIN NEUROELECTRONICS SL,MICRO RESIST TECHNOLOGY GESELLSCHAFT FUER CHEMISCHE MATERIALIEN SPEZIELLER PHOTORESISTSYSTEME MBH,KIT,Plastic Logic (United Kingdom),VARTA INNOVATION GMBH,OINT,GRAPHENE-XT SRL,LEONARDO,Carlos III University of Madrid,BMW (Germany),Singulus (Germany),CEA,UMINHO,RWTH,VRS,CRAYONANO AS,GRAPHMATECH AB,CRF,UCL,DIPC,AALTO,Printed Electronics Ltd,Imperial,INSERM,ICFO,UniPi,UZH,CIC biomaGUNE,confinis,LHT,AIRBUS HELICOPTERS,Siemens (Germany),QMUL,FNSR,Nanesa,AIXTRON LIMITED,IAW,ARCELORMITTAL,UPSud,QURV TECHNOLOGIES SL,IMech-BAS,Naturality Research & Development,CNR,CHALMERS INDUSTRITEK,EMBERION OY,TECNIUM,UNISTRA,WUT,Mellanox Technologies (Israel),NOKIA UK LIMITED,CNIT,University of Rome Tor Vergata,TU/e,TEMAS AG TECHNOLOGY AND MANAGEMENT SERVICES,INDORAMA VENTURES FIBERS GERMANY GMBH,Bundeswehr,AVANZARE,VMI,SUSS MicroTec Photomask Equipment,TECNALIA,BOKU,University of Ulm,FSU,University of Manchester,AIXTRON SE,UT,BIOAGE,BMVg,Mellanox Technologies (United States),University of Groningen,ICN2,EVONIK CREAVIS GMBH,FAU,NanoTechLab,FHG,ITME,TUD,FIOH,NAWATECHNOLOGIES,IMEC,DALLARA AUTOMOBILI SPA,INTER-QUIMICA,DTU,SISSA,University of Zaragoza,Sonaca (Belgium),AIRBUS DEFENCE AND SPACE GMBH,Composites Evolution (United Kingdom),HCPB,UAB,NOVALIA LIMITED,NOKIA SOLUTIONS AND NETWORKS ITALIA SPA,MEDICA SPA,NPL MANAGEMENT LIMITED,SCHAFFHAUSEN INSTITUTE OF TECHNOLOGY AG,HITACHI ENERGY SWEDEN AB,BASF SE,EVONIK DEGUSSA GmbH,IMDEA NANO,Umeå University,University of Ioannina,AMALYST,TME,Airbus (Netherlands),ULB,UNITS,GRAPHENEA SEMICONDUCTOR SL,IIT,INTERNACIONAL DE COMPOSITES SA,EPFL,G TEC,EGP,Technion – Israel Institute of Technology,SPAC SPA,ICON LIFESAVER LIMITED,BRETON SPA,KI,SIEC BADAWCZA LUKASIEWICZ - INSTYTUT MIKROELEKTRONIKI I FOTONIKI,ESF,BARNICES Y PINTURAS MODERNAS SOCIEDAD ANONIMA,UNIGE,BRUNO BALDASSARI & FRATELLI SPA,Sorbonne University,UH,USTL,Universität Augsburg,THE CHANCELLOR, MASTERS AND SCHOLARS OF THE UNIVERSITY OF CAMBRIDGE,IDIBAPS-CERCA,University of Warwick,CIC nanoGUNE,Lancaster University,PHI-STONE AG,Philipps-University of Marburg,POLYMEM,CAMBRIDGE RAMAN IMAGING LTD,EPFZ,EMPA,TEMAS SOLUTIONS GMBH,ΕΛΜΕΠΑ,FIDAMC,THALESFunder: European Commission Project Code: 881603Overall Budget: 149,703,008 EURFunder Contribution: 149,703,008 EURThis proposal describes the third core project of the Graphene Flagship. It forms the fourth phase of the FET flagship and is characterized by a continued transition towards higher technology readiness levels, without jeopardizing our strong commitment to fundamental research. Compared to the second core project, this phase includes a substantial increase in the market-motivated technological spearhead projects, which account for about 30% of the overall budget. The broader fundamental and applied research themes are pursued by 15 work packages and supported by four work packages on innovation, industrialization, dissemination and management. The consortium that is involved in this project includes over 150 academic and industrial partners in over 20 European countries.
more_vert Open Access Mandate for Publications assignment_turned_in Project2020 - 2024Partners:UCLM, SIXONIA TECH, NSN, AMALYST, University of Rome Tor Vergata +186 partnersUCLM,SIXONIA TECH,NSN,AMALYST,University of Rome Tor Vergata,INDORAMA VENTURES FIBERS GERMANY GMBH,AVANZARE,UH,UNISTRA,AALTO,Imperial,INSERM,ICFO,IIT,INTERNACIONAL DE COMPOSITES SA,LNE,TU Delft,Emberion Ltd,UNISA,Trinity College Dublin, Ireland,Infineon Technologies (Germany),SCHAFFHAUSEN INSTITUTE OF TECHNOLOGY AG,NanOsc AB,STMicroelectronics (Switzerland),INBRAIN NEUROELECTRONICS SL,Siemens (Germany),MICRO RESIST TECHNOLOGY GESELLSCHAFT FUER CHEMISCHE MATERIALIEN SPEZIELLER PHOTORESISTSYSTEME MBH,TUD,ARCELORMITTAL,FIOH,UPSud,QMUL,UT,FNSR,BIOAGE,BMVg,AIXTRON LIMITED,Mellanox Technologies (United States),IMEC,DALLARA AUTOMOBILI SPA,IAW,UniPi,EMBERION OY,HCPB,ABB AB,QURV TECHNOLOGIES SL,SUSS MicroTec Photomask Equipment,MCS,HUN-REN CENTRE FOR ENERGY RESEARCH,EPFL,TECNALIA,CNR,OINT,SISSA,KIT,UCL,BOKU,IDIBAPS,Plastic Logic (United Kingdom),LEONARDO,CIC ENERGIGUNE,ULB,AIRBUS OPERATIONS SL,UMINHO,UNIPD,University of Regensburg,UNITS,G.TEC MEDICAL ENGINEERING GMBH,CIC biomaGUNE,ICON LIFESAVER LIMITED,HEIDELBERG MATERIALS ITALIA CEMENTI SPA,UAB,DI,BASF SE,CRF,GRAPHENE-XT SRL,EVONIK DEGUSSA GmbH,CAU,CEA,Varta Microbattery (Germany),GRUPO ANTOLIN-INGENIERIA SA,RWTH,BRETON SPA,IMDEA NANO,FIDAMC,CSIC,VRS,NAWATECHNOLOGIES,SUSS MicroTec Lithography GmbH,Chalmers University of Technology,THALES,UCL,DIPC,FOUNDATION FOR RESEARCH AND TECHNOLOGYHELLAS,Bundeswehr University Munich,LHT,AIRBUS HELICOPTERS,Philipps-University of Marburg,MAGNA ELECTRONICS SWEDEN AB,3SUN S.R.L.,Printed Electronics Ltd,UZH,NOKIA UK LIMITED,confinis,TU/e,Nanesa,Bundeswehr,VMI,USTL,Universität Augsburg,EAB,BMW Group (Germany),PIXIUM VISION,THE CHANCELLOR, MASTERS AND SCHOLARS OF THE UNIVERSITY OF CAMBRIDGE,IDIBAPS-CERCA,VARTA INNOVATION GMBH,University of Sheffield,MPG,Umeå University,University of Ioannina,IHP GMBH,BSL,University of Bremen,TECNIUM,UNIVERSITE DE LILLE,University of Manchester,INSTITUTO NACIONAL DE INVESTIGACION Y TECNOLOGIA AGRARIA Y ALIMENTARIA OA MP,TME,BEDIMENSIONAL SPA,AMO GMBH,Polytechnic University of Milan,University of Groningen,TEKNOLOGIAN TUTKIMUSKESKUS VTT OY,Carlos III University of Madrid,TUW,Singulus (Germany),University of Warwick,ICN2,CRAYONANO AS,GRAPHMATECH AB,BMW (Germany),University of Ulm,AIRBUS DEFENCE AND SPACE GMBH,University of Nottingham,POLYMEM,CNRS,CIBER,ProGnomics Ltd.,Composites Evolution (United Kingdom),KI,SIEC BADAWCZA LUKASIEWICZ - INSTYTUT MIKROELEKTRONIKI I FOTONIKI,ESF,BRUNO BALDASSARI & FRATELLI SPA,M-Solv,MEDICA SPA,FSU,AIXTRON SE,NPL MANAGEMENT LIMITED,CAMBRIDGE RAMAN IMAGING LTD,EPFZ,TEMAS SOLUTIONS GMBH,ΕΛΜΕΠΑ,CHALMERS INDUSTRITEK,FHG,ITME,NanoTechLab,CNIT,INTER-QUIMICA,DTU,University of Zaragoza,NOVALIA LIMITED,NOKIA SOLUTIONS AND NETWORKS ITALIA SPA,IMech-BAS,Naturality Research & Development,FAU,Sonaca (Belgium),GRAPHENEA SEMICONDUCTOR SL,SPAC SPA,Lancaster University,PHI-STONE AG,EGP,Airbus (Netherlands),EMPA,WUT,Mellanox Technologies (Israel),G TEC,UNIGE,Sorbonne University,CIC nanoGUNE,Technion – Israel Institute of Technology,BARNICES Y PINTURAS MODERNAS SOCIEDAD ANONIMAFunder: European Commission Project Code: 952792Overall Budget: 20,000,000 EURFunder Contribution: 20,000,000 EURThe 2D Experimental Pilot Line (2D-EPL) project will establish a European ecosystem for prototype production of Graphene and Related Materials (GRM) based electronics, photonics and sensors. The project will cover the whole value chain including tool manufacturers, chemical and material providers and pilot lines to offer prototyping services to companies, research centers and academics. The 2D-EPL targets to the adoption of GRM integration by commercial semiconductor foundries and integrated device manufacturers through technology transfer and licensing. The project is built on two pillars. In Pillar 1, the 2D-EPL will offer prototyping services for 150 and 200 mm wafers, based on the current state of the art graphene device manufacturing and integration techniques. This will ensure external users and customers are served by the 2D-EPL early in the project and guarantees the inclusion of their input in the development of the final processes by providing the specifications on required device layouts, materials and device performances. In Pillar 2, the consortium will develop a fully automated process flow on 200 and 300 mm wafers, including the growth and vacuum transfer of single crystalline graphene and TMDCs. The knowledge gained in Pillar 2 will be transferred to Pillar 1 to continuously improve the baseline process provided by the 2D-EPL. To ensure sustainability of the 2D-EPL service after the project duration, integration with EUROPRACTICE consortium will be prepared. It provides for the European actors a platform to develop smart integrated systems, from advanced prototype design to small volume production. In addition, for the efficiency of the industrial exploitation, an Industrial Advisory Board consisting mainly of leading European semiconductor manufacturers and foundries will closely track and advise the progress of the 2D-EPL. This approach will enable European players to take the lead in this emerging field of technology.
more_vert Open Access Mandate for Publications and Research data assignment_turned_in Project2018 - 2022Partners:FHG, VO, FNSR, Optocap Ltd, III V Lab +13 partnersFHG,VO,FNSR,Optocap Ltd,III V Lab,Alcatel-Lucent (France),Nextworks (Italy),Aristotle University of Thessaloniki,SMART PHOTONICS BV,NOKIA NETWORKS FRANCE,VPIphotonics (Germany),TU/e,IMEC,DTU,Finisar (United States),Finisar (Sweden),Telecom Italia (Italy),ICCSFunder: European Commission Project Code: 780354Overall Budget: 7,999,560 EURFunder Contribution: 7,999,560 EURSustained 2-digit growth in internet traffic is raising the need for new photonic technologies enabling Petabit/s network capacities, whereas suppressed operator margins call for new concepts to make these networks more efficient. QAMeleon aims at a holistic solution towards scaling metro/core networks to the next decade. A new generation of SDN-programmable photonic components, modules and subsystems will be delivered, employing sliceability as a means of optimizing resource utilization and cutting operator costs by >30%. At the transponder side, QAMeleon will develop components for 2 generations ahead: Operating at 128 Gbaud, they will bring significant savings in footprint (>13×), energy/bit (10.4×) and cost/bit (>4.3×). At the ROADM side, QAMeleon will develop large-scale flex-grid wavelength-selective switches (1×24 WSS) and transponder aggregators (8×24 TPA), reducing footprint and cost/port by more than 40% and 28% respectively, with energy savings per ROADM node reaching 4×. Addressing the emerging needs of 5G network backhaul and datacenter interconnect (DCI) metro-access networks where dynamicity is pivotal, QAMeleon will develop an integrated flex-grid 1×4 WSS with nanosecond-scale switching time. The fast 1×4 WSS will be scalable to large channel counts (i.e. full C-band) and will enable savings in footprint, energy consumption and cost by 20×, 11.5× and 36% respectively. QAMeleon will integrate its innovative photonic components into functional subsystems: A 3 Tb/s sliceable bandwidth-variable transponder (S-BVT), a flexible ROADM with large-scale WSSs and TPAs, and a fast ROADM for metro-access. All necessary SDN software extensions, plugins and application interfaces will be developed, providing a complete functional SDN framework for the sliceable “white box” subsystems. QAMeleon’s devices will be integrated with the SDN software and validated in scalable demonstrators at Nokia’s lab infrastructure and on TIM’s deployed regional network fiber plant
more_vert Open Access Mandate for Publications assignment_turned_in Project2018 - 2020Partners:M-Solv, UNIBAS, FAU, AUREL SPA, CRF +193 partnersM-Solv,UNIBAS,FAU,AUREL SPA,CRF,UZH,confinis,SPAC SPA,Nanesa,FSU,RWTH,TU/e,Bundeswehr,VRS,University of Groningen,USTL,VMI,Lancaster University,PHI-STONE AG,ICN2,Universität Augsburg,E. AMALDI FOUNDATION,WUT,CAU,Mellanox Technologies (Israel),Varta Microbattery (Germany),Evonik Nutrition & Care GmbH,DropSens S.L.,Polytechnic University of Milan,GRUPO ANTOLIN-INGENIERIA SA,LNE,TU Delft,Trinity College Dublin, Ireland,Infineon Technologies (Germany),MAGNA ELECTRONICS SWEDEN AB,NanOsc AB,BMW Group (Germany),INSTITUTO NACIONAL DE INVESTIGACION Y TECNOLOGIA AGRARIA Y ALIMENTARIA OA MP,EVONIK CREAVIS GMBH,Technion – Israel Institute of Technology,THE CHANCELLOR, MASTERS AND SCHOLARS OF THE UNIVERSITY OF CAMBRIDGE,EAB,TUD,PIXIUM VISION,Siemens (Germany),FIOH,Carlos III University of Madrid,Chalmers University of Technology,QMUL,UniPi,TECNIUM,KI,FNSR,FBK,Singulus (Germany),Sonaca (Belgium),AIXTRON LIMITED,CNR,ALCATEL ITALIA,BEDIMENSIONAL SPA,POLYMEM,IAW,UOXF,WALTER PACK,SCHAFFHAUSEN INSTITUTE OF TECHNOLOGY AG,CNIT,SIEC BADAWCZA LUKASIEWICZ - INSTYTUT MIKROELEKTRONIKI I FOTONIKI,CRAYONANO AS,HITACHI ENERGY SWEDEN AB,CAMBRIDGE RAMAN IMAGING LTD,EPFZ,TEKNOLOGIAN TUTKIMUSKESKUS VTT OY,DELTA TECH SPA,GRAPHMATECH AB,NOKIA SOLUTIONS AND NETWORKS UK LIMITED,KIT,CEA,ΕΛΜΕΠΑ,BARNICES Y PINTURAS MODERNAS SOCIEDAD ANONIMA,University of Bremen,UT,BIOAGE,ESF,UAB,IMech-BAS,Naturality Research & Development,BMVg,Robert Bosch (Germany),UCLM,LHT,BASF SE,EVONIK DEGUSSA GmbH,IMDEA NANO,LITHOPS SRL,ABB AB,Mellanox Technologies (United States),FIDAMC,UNIBO,UNISA,Plastic Logic (United Kingdom),UNIGE,ARCELORMITTAL,BRUNO BALDASSARI & FRATELLI SPA,Sorbonne University,EMPA,CIC nanoGUNE,Emberion Ltd,IMEC,DALLARA AUTOMOBILI SPA,THALES,BSL,AIRBUS HELICOPTERS,LEONARDO,UNISTRA,Airbus (Netherlands),SIXONIA TECH,AMO GMBH,IKS,University of Ulm,NSN,G TEC,UCL,TUW,HEIDELBERG MATERIALS ITALIA CEMENTI SPA,DIPC,FHG,University of Sheffield,AALTO,EMBERION OY,NanoTechLab,Printed Electronics Ltd,MPG,BMW (Germany),ICON LIFESAVER LIMITED,CSIC,STMicroelectronics (Switzerland),ULB,BRETON SPA,Umeå University,ITME,AIRBUS DEFENCE AND SPACE GMBH,EGP,University of Ioannina,Imperial,UNITS,INSERM,Composites Evolution (United Kingdom),SISSA,FOUNDATION FOR RESEARCH AND TECHNOLOGYHELLAS,EPFL,Bundeswehr University Munich,TME,GRAPHENEA SEMICONDUCTOR SL,ICFO,AMALYST,CHALMERS INDUSTRITEK,GRAPHENE-XT SRL,MCS,HUN-REN CENTRE FOR ENERGY RESEARCH,Chemnitz University of Technology,IIT,University of Nottingham,TECNALIA,INTERNACIONAL DE COMPOSITES SA,CNRS,CIBER,Graphenea (Spain),TUHH,University of Rome Tor Vergata,MEDICA SPA,IDIBAPS,TEMAS AG TECHNOLOGY AND MANAGEMENT SERVICES,OINT,ProGnomics Ltd.,CIC ENERGIGUNE,INTER-QUIMICA,NPL MANAGEMENT LIMITED,UCL,DTU,DI,NAWATECHNOLOGIES,INDORAMA VENTURES FIBERS GERMANY GMBH,University of Zaragoza,Technological Educational Institute of Crete,University of Freiburg,NOVALIA LIMITED,AVANZARE,GALVANI BIOELECTRONICS LIMITED,NOKIA UK LIMITED,CIC biomaGUNE,NOKIA SOLUTIONS AND NETWORKS ITALIA SPA,University of Manchester,AIRBUS OPERATIONS SL,University of Warwick,BOKU,UNIPD,University of Regensburg,UMINHOFunder: European Commission Project Code: 785219Overall Budget: 88,000,000 EURFunder Contribution: 88,000,000 EURThis proposal describes the third stage of the EC-funded part of the Graphene Flagship. It builds upon the results achieved in the ramp-up phase (2013 - 2016) and the first core project (2016 - 2018), and covers the period April 2018 - March 2020. The progress of the flagship follows the general plans set out in the Framework Partnership Agreement, and the second core project represents an additional step towards higher technology and manufacturing readiness levels. The Flagship is built upon the concept of value chains, one of which is along the axis of materials-components-systems; the ramp-up phase placed substantial resources on the development of materials production technologies, the first core project moved to emphasise components, and the second core project will move further towards integrating components in larger systems. This evolution is manifested, e.g., in the introduction of six market-motivated spearhead projects during the Core 2 project.
more_vert Open Access Mandate for Publications assignment_turned_in Project2015 - 2019Partners:UNIPV, UPSud, FNSR, CEA, CIT +8 partnersUNIPV,UPSud,FNSR,CEA,CIT,SEAGATE SYSTEMS,STMicroelectronics (Switzerland),USTAN,AYMING,STM CROLLES,University of Paris-Saclay,VO,University of SouthamptonFunder: European Commission Project Code: 688516Overall Budget: 3,993,680 EURFunder Contribution: 3,736,900 EURThe COSMICC consortium gathers key industrial and research partners with world-leading positions in the fields of Silicon photonics, CMOS electronics, Printed Circuit Board-Packaging, Optical transceivers and Data-Centers around a strong vision: mass commercialization of Si-photonics-based transceivers is possible starting in 2019 by enhancing the existing photonic integration platform of one of the partners, STMicroelectronics. COSMICC will develop optical transceivers that will be packaged on-board. Combining CMOS electronics and Si-photonics with innovative-high-throughput fiber-attachment techniques, the developed solutions are scalable to meet the future data-transmission requirements in data-centers and Super computing systems. With performances improved by an order of magnitude as compared with current VCSELs transceivers, COSMICC developed technology will answer tremendous market needs with a target cost per bit that the traditional WDM transceivers cannot meet. The early setting up of a new value chain will enable exploitation of the developed technologies. In a first high reward step-modification of the fabrication platform, COSMICC consortium will achieve mid-board optical transceivers in the [2Tbit/s -2pJ/bit- 0.2€ per Gbit/s]-class with ~200Gbit/s per fiber: the introduction of one process brick (SiN layer) in the photonic process will enable low-cost packaging techniques (up to 2x12 fiber channels) and practical coarse WDM implementation (4 wavelengths with no temperature-control requirements). The built demonstrators will be tested in lab and field environments. In compliancy with the enhanced-fabrication platform, lasers will be developed by heterogeneous integration of III-V material, targeting improved temperature behavior, and doubled-bit-rate payback. A second step-modification of the fabrication platform will consist in evaluating a disruptive process that enables SiGe layers with tunable Si-composition for achieving micrometer-scale devices.
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