
NOKIA SOLUTIONS AND NETWORKS ITALIA SPA
NOKIA SOLUTIONS AND NETWORKS ITALIA SPA
12 Projects, page 1 of 3
Open Access Mandate for Publications and Research data assignment_turned_in Project2023 - 2026Partners:CEA, XGS, X-FAB MEMS FOUNDRY GmbH, Mellanox Technologies (United States), PHIX BV +11 partnersCEA,XGS,X-FAB MEMS FOUNDRY GmbH,Mellanox Technologies (United States),PHIX BV,ARYBALLE TECHNOLOGIES,LGT-FR,NOKIA SOLUTIONS AND NETWORKS ITALIA SPA,IMEC,PHOTONFIRST,X-FAB FRANCE,SMART PHOTONICS BV,Mellanox Technologies (Israel),LUCEDA PHOTONICS,BROLIS SENSOR TECHNOLOGY,THALESFunder: European Commission Project Code: 101111896Overall Budget: 41,945,600 EURFunder Contribution: 13,192,700 EURphotonixFAB brings together key European photonics and semiconductor players, to establish a strong and sovereign European supply chain for silicon photonics. The consortium leverages the volume capacity of X-FAB, the European More-than-Moore foundry, and addresses the work program with six key objectives: (1) Transferring IMEC's world-renowned silicon-on-insulator (SOI) platform to X-FAB, to achieve industrial manufacturing capacity. The SOI platform addresses a variety of high-speed and sensing applications. (2) Extending the industrial manufacturing capability of LIGENTEC's silicon nitride (SiN) technology at X-FAB, to become the industry standard for SiN photonics. The low-loss, and broad transparency of SiN are perfect for sensing, quantum computing, amongst others. (3) Increasing maturity of heterogeneous integration with SMART Photonics' Indium Phosphide (InP) active components such as lasers, modulators and detectors. These components are integrated on top of the SOI and SiN platforms by transfer-printing. This is an X-FAB associated technology, forming a key innovation differentiator for photonixFAB. The leading European RTOs, IMEC and CEA, are supporting photonixFAB with various technologies, developed in Horizon Europe activities, such as prototype transfer-printing, LiNbO3 modulators and Ge detectors on SiN. (4) Strengthening the European ecosystem with design automation (Luceda), innovative packaging solutions (PHIX), and increased testing capabilities. (5) Demonstrating the viability of the new supply chain and technologies through six application-oriented demonstrators in a wide array of markets. (6) Setting up pilot line and multi-project wafer access to serve innovation by start-ups, SMEs and large entities, and opening photonixFAB for direct feedback on competitiveness and capabilities. Thereby the relationships between the supply chain partners and prospective end-users, as well as between the photonics and the ECS worlds will be strengthened.
more_vert Open Access Mandate for Publications and Research data assignment_turned_in Project2025 - 2028Partners:CEA, UBx, KIT, Polytechnic University of Milan, III V Lab +12 partnersCEA,UBx,KIT,Polytechnic University of Milan,III V Lab,University of Patras,IMST,STMicroelectronics (Switzerland),NOKIA NETWORKS FRANCE,P-NET NEW GENERATION EMERGING NETWORKS & VERTICALS PRIVATE COMPANY,AMIRES THE BUSINESS INNOVATION MANAGEMENT INSTITUTE ZU,FHG,DTU,TP,NOKIA SOLUTIONS AND NETWORKS ITALIA SPA,STM CROLLES,STFunder: European Commission Project Code: 101192681Overall Budget: 10,360,400 EURFunder Contribution: 9,974,740 EURX-TREME 6G proposal relies on a unique industry led consortium to provide a foundational open microelectronics platform in Europe with the objective to create and design key disruptive next generation chiplets and chipsets for 6G use cases. The idea is to break-up the full potential of best-in-class Silicon BiCMOS, InP and heterogeneous 3D integration for high capacity radio access technologies such as wireless back-hauling at sub-TeraHertz frequencies, Joint Communication And Sensing, Non Terrestrial Networks and Network as a Sensor. New classes of chipsets will unleash the full potential of 6G and enable the emergence of new applications through specific developments for the underpinning novel microelectronic technologies. X-TREME 6G valorizes also resource efficient 6G algorithms and an ML/AI software toolbox for computationally efficient silicon-ready baseband extensions. Part of the SNS “Microelectronic Lighthouse” visionary initiative, the proposal’s ambition is to establish and maintain a sustainable open platform for the duration of the SNS program and beyond, to support 6G verticals. By nurturing the links with the emerging Chips JU pilot lines, the platform acts as a first fabric to accelerate joint initiatives between SNS and Chips JUs. In a nutshell, X-TREME 6G will provide tangible contributions towards an experimentation EU framework for 6G, demonstrating the full benefit of the newly developed chipsets and chiplets for a set of emerging 6G high potential use cases (wireless back-hauling, JCAS, NTN, NaS); while being open to dynamically support the emerging 6G ecosystem (SMEs, Industries, Service Providers, Government etc.) and evaluate additional 6G challenges and expectations. By strengthening and extending the 6G functionality and microelectronics supply chain, X-TREME 6G contributes towards a network-centric democratized and open 6G ecosystem able to release the current hyperscaler’s market embrace, while empowers European Industry at large.
more_vert Open Access Mandate for Publications assignment_turned_in Project2020 - 2023Partners:FOUNDATION FOR RESEARCH AND TECHNOLOGYHELLAS, Bundeswehr University Munich, 3SUN S.R.L., UNIPD, University of Regensburg +190 partnersFOUNDATION FOR RESEARCH AND TECHNOLOGYHELLAS,Bundeswehr University Munich,3SUN S.R.L.,UNIPD,University of Regensburg,IDIBAPS,CIC ENERGIGUNE,University of Bremen,UNIVERSITE DE LILLE,CSIC,G.TEC MEDICAL ENGINEERING GMBH,IHP GMBH,BSL,SIXONIA TECH,TUW,NSN,HEIDELBERG MATERIALS ITALIA CEMENTI SPA,University of Nottingham,CNRS,CIBER,UNISA,ProGnomics Ltd.,Emberion Ltd,EAB,PIXIUM VISION,Polytechnic University of Milan,Trinity College Dublin, Ireland,SUSS MicroTec Lithography GmbH,Chalmers University of Technology,NanOsc AB,AMO GMBH,DI,LNE,TU Delft,UCL,BEDIMENSIONAL SPA,TEKNOLOGIAN TUTKIMUSKESKUS VTT OY,CAU,Varta Microbattery (Germany),Evonik Nutrition & Care GmbH,GRUPO ANTOLIN-INGENIERIA SA,MAGNA ELECTRONICS SWEDEN AB,MCS,Infineon Technologies (Germany),HUN-REN CENTRE FOR ENERGY RESEARCH,AIRBUS OPERATIONS SL,M-Solv,University of Sheffield,MPG,STMicroelectronics (Switzerland),BMW Group (Germany),INSTITUTO NACIONAL DE INVESTIGACION Y TECNOLOGIA AGRARIA Y ALIMENTARIA OA MP,UCLM,ABB AB,INBRAIN NEUROELECTRONICS SL,MICRO RESIST TECHNOLOGY GESELLSCHAFT FUER CHEMISCHE MATERIALIEN SPEZIELLER PHOTORESISTSYSTEME MBH,KIT,Plastic Logic (United Kingdom),VARTA INNOVATION GMBH,OINT,GRAPHENE-XT SRL,LEONARDO,Carlos III University of Madrid,BMW (Germany),Singulus (Germany),CEA,UMINHO,RWTH,VRS,CRAYONANO AS,GRAPHMATECH AB,CRF,UCL,DIPC,AALTO,Printed Electronics Ltd,Imperial,INSERM,ICFO,UniPi,UZH,CIC biomaGUNE,confinis,LHT,AIRBUS HELICOPTERS,Siemens (Germany),QMUL,FNSR,Nanesa,AIXTRON LIMITED,IAW,ARCELORMITTAL,UPSud,QURV TECHNOLOGIES SL,IMech-BAS,Naturality Research & Development,CNR,CHALMERS INDUSTRITEK,EMBERION OY,TECNIUM,UNISTRA,WUT,Mellanox Technologies (Israel),NOKIA UK LIMITED,CNIT,University of Rome Tor Vergata,TU/e,TEMAS AG TECHNOLOGY AND MANAGEMENT SERVICES,INDORAMA VENTURES FIBERS GERMANY GMBH,Bundeswehr,AVANZARE,VMI,SUSS MicroTec Photomask Equipment,TECNALIA,BOKU,University of Ulm,FSU,University of Manchester,AIXTRON SE,UT,BIOAGE,BMVg,Mellanox Technologies (United States),University of Groningen,ICN2,EVONIK CREAVIS GMBH,FAU,NanoTechLab,FHG,ITME,TUD,FIOH,NAWATECHNOLOGIES,IMEC,DALLARA AUTOMOBILI SPA,INTER-QUIMICA,DTU,SISSA,University of Zaragoza,Sonaca (Belgium),AIRBUS DEFENCE AND SPACE GMBH,Composites Evolution (United Kingdom),HCPB,UAB,NOVALIA LIMITED,NOKIA SOLUTIONS AND NETWORKS ITALIA SPA,MEDICA SPA,NPL MANAGEMENT LIMITED,SCHAFFHAUSEN INSTITUTE OF TECHNOLOGY AG,HITACHI ENERGY SWEDEN AB,BASF SE,EVONIK DEGUSSA GmbH,IMDEA NANO,Umeå University,University of Ioannina,AMALYST,TME,Airbus (Netherlands),ULB,UNITS,GRAPHENEA SEMICONDUCTOR SL,IIT,INTERNACIONAL DE COMPOSITES SA,EPFL,G TEC,EGP,Technion – Israel Institute of Technology,SPAC SPA,ICON LIFESAVER LIMITED,BRETON SPA,KI,SIEC BADAWCZA LUKASIEWICZ - INSTYTUT MIKROELEKTRONIKI I FOTONIKI,ESF,BARNICES Y PINTURAS MODERNAS SOCIEDAD ANONIMA,UNIGE,BRUNO BALDASSARI & FRATELLI SPA,Sorbonne University,UH,USTL,Universität Augsburg,THE CHANCELLOR, MASTERS AND SCHOLARS OF THE UNIVERSITY OF CAMBRIDGE,IDIBAPS-CERCA,University of Warwick,CIC nanoGUNE,Lancaster University,PHI-STONE AG,Philipps-University of Marburg,POLYMEM,CAMBRIDGE RAMAN IMAGING LTD,EPFZ,EMPA,TEMAS SOLUTIONS GMBH,ΕΛΜΕΠΑ,FIDAMC,THALESFunder: European Commission Project Code: 881603Overall Budget: 149,703,008 EURFunder Contribution: 149,703,008 EURThis proposal describes the third core project of the Graphene Flagship. It forms the fourth phase of the FET flagship and is characterized by a continued transition towards higher technology readiness levels, without jeopardizing our strong commitment to fundamental research. Compared to the second core project, this phase includes a substantial increase in the market-motivated technological spearhead projects, which account for about 30% of the overall budget. The broader fundamental and applied research themes are pursued by 15 work packages and supported by four work packages on innovation, industrialization, dissemination and management. The consortium that is involved in this project includes over 150 academic and industrial partners in over 20 European countries.
more_vert Open Access Mandate for Publications and Research data assignment_turned_in Project2022 - 2026Partners:IIT, ARQUIMEA RESEARCH CENTER SL, MAGNA ELECTRONICS SWEDEN AB, CNRS, CAMGRAPHIC SRL +3 partnersIIT,ARQUIMEA RESEARCH CENTER SL,MAGNA ELECTRONICS SWEDEN AB,CNRS,CAMGRAPHIC SRL,NOKIA SOLUTIONS AND NETWORKS ITALIA SPA,IHP GMBH,CNITFunder: European Commission Project Code: 101070482Overall Budget: 4,781,500 EURFunder Contribution: 4,781,500 EURGraph-X aims at the development of a novel hardware platform based on graphene photonic integrated circuits for ultra-high speed and scalable sub-THz D- (110-170 GHz) and H-band (170-240 GHz) wireless links. The proposed technology will be the basic building block for high-speed radio back haul links, multi beam forming antennas for massive MIMO, short distance high resolution RADAR sensing. GraPh-X targets the distribution and detection of multi Gbit/s radio signals over sub-THz tunable carrier frequencies. The main outcome of GraPh-X will be a monolithic electronic and photonic chip (EPIC) that will constitute the basic building block of a completely new class of photonic/electronic antenna arrays for the next generation sub-THz communication and RADAR systems. The proposed approach will allow to overcome the technical bottlenecks of current sub-THz technology, such as increasing detrimental effect of phase noise at higher carrier frequencies, and carrier frequency stability. To reach the goal, the wafer scale graphene photonic technology is needed and must go beyond the state of the art. A new technique (HMG-Stack technology) will be developed to allow multi-stacking of graphene layers maintaining the same properties of single layer graphene. The key component of GraPh-X is a novel optoelectronic efficient frequency mixer able to mix two optical wavelengths and a high data rate electrical signal. The photonic chip will be realized using a SiN photonic platform that will integrate HMG-Stack as active material. The monolithic integration of the graphene photonic mixer with SiGe BiCMOS electronics for mmWave amplification will enable high output power and reduced footprint (<500x500µm2), matching the requirements of a single element of mmWave antenna array system.
more_vert Open Access Mandate for Publications assignment_turned_in Project2020 - 2024Partners:UCLM, SIXONIA TECH, NSN, AMALYST, University of Rome Tor Vergata +186 partnersUCLM,SIXONIA TECH,NSN,AMALYST,University of Rome Tor Vergata,INDORAMA VENTURES FIBERS GERMANY GMBH,AVANZARE,UH,UNISTRA,AALTO,Imperial,INSERM,ICFO,IIT,INTERNACIONAL DE COMPOSITES SA,LNE,TU Delft,Emberion Ltd,UNISA,Trinity College Dublin, Ireland,Infineon Technologies (Germany),SCHAFFHAUSEN INSTITUTE OF TECHNOLOGY AG,NanOsc AB,STMicroelectronics (Switzerland),INBRAIN NEUROELECTRONICS SL,Siemens (Germany),MICRO RESIST TECHNOLOGY GESELLSCHAFT FUER CHEMISCHE MATERIALIEN SPEZIELLER PHOTORESISTSYSTEME MBH,TUD,ARCELORMITTAL,FIOH,UPSud,QMUL,UT,FNSR,BIOAGE,BMVg,AIXTRON LIMITED,Mellanox Technologies (United States),IMEC,DALLARA AUTOMOBILI SPA,IAW,UniPi,EMBERION OY,HCPB,ABB AB,QURV TECHNOLOGIES SL,SUSS MicroTec Photomask Equipment,MCS,HUN-REN CENTRE FOR ENERGY RESEARCH,EPFL,TECNALIA,CNR,OINT,SISSA,KIT,UCL,BOKU,IDIBAPS,Plastic Logic (United Kingdom),LEONARDO,CIC ENERGIGUNE,ULB,AIRBUS OPERATIONS SL,UMINHO,UNIPD,University of Regensburg,UNITS,G.TEC MEDICAL ENGINEERING GMBH,CIC biomaGUNE,ICON LIFESAVER LIMITED,HEIDELBERG MATERIALS ITALIA CEMENTI SPA,UAB,DI,BASF SE,CRF,GRAPHENE-XT SRL,EVONIK DEGUSSA GmbH,CAU,CEA,Varta Microbattery (Germany),GRUPO ANTOLIN-INGENIERIA SA,RWTH,BRETON SPA,IMDEA NANO,FIDAMC,CSIC,VRS,NAWATECHNOLOGIES,SUSS MicroTec Lithography GmbH,Chalmers University of Technology,THALES,UCL,DIPC,FOUNDATION FOR RESEARCH AND TECHNOLOGYHELLAS,Bundeswehr University Munich,LHT,AIRBUS HELICOPTERS,Philipps-University of Marburg,MAGNA ELECTRONICS SWEDEN AB,3SUN S.R.L.,Printed Electronics Ltd,UZH,NOKIA UK LIMITED,confinis,TU/e,Nanesa,Bundeswehr,VMI,USTL,Universität Augsburg,EAB,BMW Group (Germany),PIXIUM VISION,THE CHANCELLOR, MASTERS AND SCHOLARS OF THE UNIVERSITY OF CAMBRIDGE,IDIBAPS-CERCA,VARTA INNOVATION GMBH,University of Sheffield,MPG,Umeå University,University of Ioannina,IHP GMBH,BSL,University of Bremen,TECNIUM,UNIVERSITE DE LILLE,University of Manchester,INSTITUTO NACIONAL DE INVESTIGACION Y TECNOLOGIA AGRARIA Y ALIMENTARIA OA MP,TME,BEDIMENSIONAL SPA,AMO GMBH,Polytechnic University of Milan,University of Groningen,TEKNOLOGIAN TUTKIMUSKESKUS VTT OY,Carlos III University of Madrid,TUW,Singulus (Germany),University of Warwick,ICN2,CRAYONANO AS,GRAPHMATECH AB,BMW (Germany),University of Ulm,AIRBUS DEFENCE AND SPACE GMBH,University of Nottingham,POLYMEM,CNRS,CIBER,ProGnomics Ltd.,Composites Evolution (United Kingdom),KI,SIEC BADAWCZA LUKASIEWICZ - INSTYTUT MIKROELEKTRONIKI I FOTONIKI,ESF,BRUNO BALDASSARI & FRATELLI SPA,M-Solv,MEDICA SPA,FSU,AIXTRON SE,NPL MANAGEMENT LIMITED,CAMBRIDGE RAMAN IMAGING LTD,EPFZ,TEMAS SOLUTIONS GMBH,ΕΛΜΕΠΑ,CHALMERS INDUSTRITEK,FHG,ITME,NanoTechLab,CNIT,INTER-QUIMICA,DTU,University of Zaragoza,NOVALIA LIMITED,NOKIA SOLUTIONS AND NETWORKS ITALIA SPA,IMech-BAS,Naturality Research & Development,FAU,Sonaca (Belgium),GRAPHENEA SEMICONDUCTOR SL,SPAC SPA,Lancaster University,PHI-STONE AG,EGP,Airbus (Netherlands),EMPA,WUT,Mellanox Technologies (Israel),G TEC,UNIGE,Sorbonne University,CIC nanoGUNE,Technion – Israel Institute of Technology,BARNICES Y PINTURAS MODERNAS SOCIEDAD ANONIMAFunder: European Commission Project Code: 952792Overall Budget: 20,000,000 EURFunder Contribution: 20,000,000 EURThe 2D Experimental Pilot Line (2D-EPL) project will establish a European ecosystem for prototype production of Graphene and Related Materials (GRM) based electronics, photonics and sensors. The project will cover the whole value chain including tool manufacturers, chemical and material providers and pilot lines to offer prototyping services to companies, research centers and academics. The 2D-EPL targets to the adoption of GRM integration by commercial semiconductor foundries and integrated device manufacturers through technology transfer and licensing. The project is built on two pillars. In Pillar 1, the 2D-EPL will offer prototyping services for 150 and 200 mm wafers, based on the current state of the art graphene device manufacturing and integration techniques. This will ensure external users and customers are served by the 2D-EPL early in the project and guarantees the inclusion of their input in the development of the final processes by providing the specifications on required device layouts, materials and device performances. In Pillar 2, the consortium will develop a fully automated process flow on 200 and 300 mm wafers, including the growth and vacuum transfer of single crystalline graphene and TMDCs. The knowledge gained in Pillar 2 will be transferred to Pillar 1 to continuously improve the baseline process provided by the 2D-EPL. To ensure sustainability of the 2D-EPL service after the project duration, integration with EUROPRACTICE consortium will be prepared. It provides for the European actors a platform to develop smart integrated systems, from advanced prototype design to small volume production. In addition, for the efficiency of the industrial exploitation, an Industrial Advisory Board consisting mainly of leading European semiconductor manufacturers and foundries will closely track and advise the progress of the 2D-EPL. This approach will enable European players to take the lead in this emerging field of technology.
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