
QURV TECHNOLOGIES SL
QURV TECHNOLOGIES SL
4 Projects, page 1 of 1
Open Access Mandate for Publications assignment_turned_in Project2020 - 2023Partners:FOUNDATION FOR RESEARCH AND TECHNOLOGYHELLAS, Bundeswehr University Munich, 3SUN S.R.L., UNIPD, University of Regensburg +190 partnersFOUNDATION FOR RESEARCH AND TECHNOLOGYHELLAS,Bundeswehr University Munich,3SUN S.R.L.,UNIPD,University of Regensburg,IDIBAPS,CIC ENERGIGUNE,University of Bremen,UNIVERSITE DE LILLE,CSIC,G.TEC MEDICAL ENGINEERING GMBH,IHP GMBH,BSL,SIXONIA TECH,TUW,NSN,HEIDELBERG MATERIALS ITALIA CEMENTI SPA,University of Nottingham,CNRS,CIBER,UNISA,ProGnomics Ltd.,Emberion Ltd,EAB,PIXIUM VISION,Polytechnic University of Milan,Trinity College Dublin, Ireland,SUSS MicroTec Lithography GmbH,Chalmers University of Technology,NanOsc AB,AMO GMBH,DI,LNE,TU Delft,UCL,BEDIMENSIONAL SPA,TEKNOLOGIAN TUTKIMUSKESKUS VTT OY,CAU,Varta Microbattery (Germany),Evonik Nutrition & Care GmbH,GRUPO ANTOLIN-INGENIERIA SA,MAGNA ELECTRONICS SWEDEN AB,MCS,Infineon Technologies (Germany),HUN-REN CENTRE FOR ENERGY RESEARCH,AIRBUS OPERATIONS SL,M-Solv,University of Sheffield,MPG,STMicroelectronics (Switzerland),BMW Group (Germany),INSTITUTO NACIONAL DE INVESTIGACION Y TECNOLOGIA AGRARIA Y ALIMENTARIA OA MP,UCLM,ABB AB,INBRAIN NEUROELECTRONICS SL,MICRO RESIST TECHNOLOGY GESELLSCHAFT FUER CHEMISCHE MATERIALIEN SPEZIELLER PHOTORESISTSYSTEME MBH,KIT,Plastic Logic (United Kingdom),VARTA INNOVATION GMBH,OINT,GRAPHENE-XT SRL,LEONARDO,Carlos III University of Madrid,BMW (Germany),Singulus (Germany),CEA,UMINHO,RWTH,VRS,CRAYONANO AS,GRAPHMATECH AB,CRF,UCL,DIPC,AALTO,Printed Electronics Ltd,Imperial,INSERM,ICFO,UniPi,UZH,CIC biomaGUNE,confinis,LHT,AIRBUS HELICOPTERS,Siemens (Germany),QMUL,FNSR,Nanesa,AIXTRON LIMITED,IAW,ARCELORMITTAL,UPSud,QURV TECHNOLOGIES SL,IMech-BAS,Naturality Research & Development,CNR,CHALMERS INDUSTRITEK,EMBERION OY,TECNIUM,UNISTRA,WUT,Mellanox Technologies (Israel),NOKIA UK LIMITED,CNIT,University of Rome Tor Vergata,TU/e,TEMAS AG TECHNOLOGY AND MANAGEMENT SERVICES,INDORAMA VENTURES FIBERS GERMANY GMBH,Bundeswehr,AVANZARE,VMI,SUSS MicroTec Photomask Equipment,TECNALIA,BOKU,University of Ulm,FSU,University of Manchester,AIXTRON SE,UT,BIOAGE,BMVg,Mellanox Technologies (United States),University of Groningen,ICN2,EVONIK CREAVIS GMBH,FAU,NanoTechLab,FHG,ITME,TUD,FIOH,NAWATECHNOLOGIES,IMEC,DALLARA AUTOMOBILI SPA,INTER-QUIMICA,DTU,SISSA,University of Zaragoza,Sonaca (Belgium),AIRBUS DEFENCE AND SPACE GMBH,Composites Evolution (United Kingdom),HCPB,UAB,NOVALIA LIMITED,NOKIA SOLUTIONS AND NETWORKS ITALIA SPA,MEDICA SPA,NPL MANAGEMENT LIMITED,SCHAFFHAUSEN INSTITUTE OF TECHNOLOGY AG,HITACHI ENERGY SWEDEN AB,BASF SE,EVONIK DEGUSSA GmbH,IMDEA NANO,Umeå University,University of Ioannina,AMALYST,TME,Airbus (Netherlands),ULB,UNITS,GRAPHENEA SEMICONDUCTOR SL,IIT,INTERNACIONAL DE COMPOSITES SA,EPFL,G TEC,EGP,Technion – Israel Institute of Technology,SPAC SPA,ICON LIFESAVER LIMITED,BRETON SPA,KI,SIEC BADAWCZA LUKASIEWICZ - INSTYTUT MIKROELEKTRONIKI I FOTONIKI,ESF,BARNICES Y PINTURAS MODERNAS SOCIEDAD ANONIMA,UNIGE,BRUNO BALDASSARI & FRATELLI SPA,Sorbonne University,UH,USTL,Universität Augsburg,THE CHANCELLOR, MASTERS AND SCHOLARS OF THE UNIVERSITY OF CAMBRIDGE,IDIBAPS-CERCA,University of Warwick,CIC nanoGUNE,Lancaster University,PHI-STONE AG,Philipps-University of Marburg,POLYMEM,CAMBRIDGE RAMAN IMAGING LTD,EPFZ,EMPA,TEMAS SOLUTIONS GMBH,ΕΛΜΕΠΑ,FIDAMC,THALESFunder: European Commission Project Code: 881603Overall Budget: 149,703,008 EURFunder Contribution: 149,703,008 EURThis proposal describes the third core project of the Graphene Flagship. It forms the fourth phase of the FET flagship and is characterized by a continued transition towards higher technology readiness levels, without jeopardizing our strong commitment to fundamental research. Compared to the second core project, this phase includes a substantial increase in the market-motivated technological spearhead projects, which account for about 30% of the overall budget. The broader fundamental and applied research themes are pursued by 15 work packages and supported by four work packages on innovation, industrialization, dissemination and management. The consortium that is involved in this project includes over 150 academic and industrial partners in over 20 European countries.
more_vert Open Access Mandate for Publications assignment_turned_in Project2020 - 2024Partners:UCLM, SIXONIA TECH, NSN, AMALYST, University of Rome Tor Vergata +186 partnersUCLM,SIXONIA TECH,NSN,AMALYST,University of Rome Tor Vergata,INDORAMA VENTURES FIBERS GERMANY GMBH,AVANZARE,UH,UNISTRA,AALTO,Imperial,INSERM,ICFO,IIT,INTERNACIONAL DE COMPOSITES SA,LNE,TU Delft,Emberion Ltd,UNISA,Trinity College Dublin, Ireland,Infineon Technologies (Germany),SCHAFFHAUSEN INSTITUTE OF TECHNOLOGY AG,NanOsc AB,STMicroelectronics (Switzerland),INBRAIN NEUROELECTRONICS SL,Siemens (Germany),MICRO RESIST TECHNOLOGY GESELLSCHAFT FUER CHEMISCHE MATERIALIEN SPEZIELLER PHOTORESISTSYSTEME MBH,TUD,ARCELORMITTAL,FIOH,UPSud,QMUL,UT,FNSR,BIOAGE,BMVg,AIXTRON LIMITED,Mellanox Technologies (United States),IMEC,DALLARA AUTOMOBILI SPA,IAW,UniPi,EMBERION OY,HCPB,ABB AB,QURV TECHNOLOGIES SL,SUSS MicroTec Photomask Equipment,MCS,HUN-REN CENTRE FOR ENERGY RESEARCH,EPFL,TECNALIA,CNR,OINT,SISSA,KIT,UCL,BOKU,IDIBAPS,Plastic Logic (United Kingdom),LEONARDO,CIC ENERGIGUNE,ULB,AIRBUS OPERATIONS SL,UMINHO,UNIPD,University of Regensburg,UNITS,G.TEC MEDICAL ENGINEERING GMBH,CIC biomaGUNE,ICON LIFESAVER LIMITED,HEIDELBERG MATERIALS ITALIA CEMENTI SPA,UAB,DI,BASF SE,CRF,GRAPHENE-XT SRL,EVONIK DEGUSSA GmbH,CAU,CEA,Varta Microbattery (Germany),GRUPO ANTOLIN-INGENIERIA SA,RWTH,BRETON SPA,IMDEA NANO,FIDAMC,CSIC,VRS,NAWATECHNOLOGIES,SUSS MicroTec Lithography GmbH,Chalmers University of Technology,THALES,UCL,DIPC,FOUNDATION FOR RESEARCH AND TECHNOLOGYHELLAS,Bundeswehr University Munich,LHT,AIRBUS HELICOPTERS,Philipps-University of Marburg,MAGNA ELECTRONICS SWEDEN AB,3SUN S.R.L.,Printed Electronics Ltd,UZH,NOKIA UK LIMITED,confinis,TU/e,Nanesa,Bundeswehr,VMI,USTL,Universität Augsburg,EAB,BMW Group (Germany),PIXIUM VISION,THE CHANCELLOR, MASTERS AND SCHOLARS OF THE UNIVERSITY OF CAMBRIDGE,IDIBAPS-CERCA,VARTA INNOVATION GMBH,University of Sheffield,MPG,Umeå University,University of Ioannina,IHP GMBH,BSL,University of Bremen,TECNIUM,UNIVERSITE DE LILLE,University of Manchester,INSTITUTO NACIONAL DE INVESTIGACION Y TECNOLOGIA AGRARIA Y ALIMENTARIA OA MP,TME,BEDIMENSIONAL SPA,AMO GMBH,Polytechnic University of Milan,University of Groningen,TEKNOLOGIAN TUTKIMUSKESKUS VTT OY,Carlos III University of Madrid,TUW,Singulus (Germany),University of Warwick,ICN2,CRAYONANO AS,GRAPHMATECH AB,BMW (Germany),University of Ulm,AIRBUS DEFENCE AND SPACE GMBH,University of Nottingham,POLYMEM,CNRS,CIBER,ProGnomics Ltd.,Composites Evolution (United Kingdom),KI,SIEC BADAWCZA LUKASIEWICZ - INSTYTUT MIKROELEKTRONIKI I FOTONIKI,ESF,BRUNO BALDASSARI & FRATELLI SPA,M-Solv,MEDICA SPA,FSU,AIXTRON SE,NPL MANAGEMENT LIMITED,CAMBRIDGE RAMAN IMAGING LTD,EPFZ,TEMAS SOLUTIONS GMBH,ΕΛΜΕΠΑ,CHALMERS INDUSTRITEK,FHG,ITME,NanoTechLab,CNIT,INTER-QUIMICA,DTU,University of Zaragoza,NOVALIA LIMITED,NOKIA SOLUTIONS AND NETWORKS ITALIA SPA,IMech-BAS,Naturality Research & Development,FAU,Sonaca (Belgium),GRAPHENEA SEMICONDUCTOR SL,SPAC SPA,Lancaster University,PHI-STONE AG,EGP,Airbus (Netherlands),EMPA,WUT,Mellanox Technologies (Israel),G TEC,UNIGE,Sorbonne University,CIC nanoGUNE,Technion – Israel Institute of Technology,BARNICES Y PINTURAS MODERNAS SOCIEDAD ANONIMAFunder: European Commission Project Code: 952792Overall Budget: 20,000,000 EURFunder Contribution: 20,000,000 EURThe 2D Experimental Pilot Line (2D-EPL) project will establish a European ecosystem for prototype production of Graphene and Related Materials (GRM) based electronics, photonics and sensors. The project will cover the whole value chain including tool manufacturers, chemical and material providers and pilot lines to offer prototyping services to companies, research centers and academics. The 2D-EPL targets to the adoption of GRM integration by commercial semiconductor foundries and integrated device manufacturers through technology transfer and licensing. The project is built on two pillars. In Pillar 1, the 2D-EPL will offer prototyping services for 150 and 200 mm wafers, based on the current state of the art graphene device manufacturing and integration techniques. This will ensure external users and customers are served by the 2D-EPL early in the project and guarantees the inclusion of their input in the development of the final processes by providing the specifications on required device layouts, materials and device performances. In Pillar 2, the consortium will develop a fully automated process flow on 200 and 300 mm wafers, including the growth and vacuum transfer of single crystalline graphene and TMDCs. The knowledge gained in Pillar 2 will be transferred to Pillar 1 to continuously improve the baseline process provided by the 2D-EPL. To ensure sustainability of the 2D-EPL service after the project duration, integration with EUROPRACTICE consortium will be prepared. It provides for the European actors a platform to develop smart integrated systems, from advanced prototype design to small volume production. In addition, for the efficiency of the industrial exploitation, an Industrial Advisory Board consisting mainly of leading European semiconductor manufacturers and foundries will closely track and advise the progress of the 2D-EPL. This approach will enable European players to take the lead in this emerging field of technology.
more_vert Open Access Mandate for Publications and Research data assignment_turned_in Project2023 - 2025Partners:QURV TECHNOLOGIES SLQURV TECHNOLOGIES SLFunder: European Commission Project Code: 101113088Overall Budget: 2,370,940 EURFunder Contribution: 2,370,940 EURThe imaging industry is experiencing a paradigm shift due to megatrends such as autonomous cars, the metaverse and service robotics, all applications powered by computer vision (CV). This subset of artificial intelligence (Al) is expected to contribute more than €2 trillion to the global economy by 2030. Present imaging technologies were designed to fulfil the needs of humans for high-quality photography but not for machines. Autonomous and intelligent systems will require re-inventing image sensors to deliver reliability and resilience under low-visibility conditions while increasing the amount of information they capture and analyse. Qurv, a company operating in this space that brings together unique world expertise, has identified power consumption and toxic materials as the common drawbacks of current solutions, hindering mass-market uptake. To address these challenges, the project QSTACK will develop and validate a wide-spectrum image sensor technology and business case that delivers unprecedented cost performance to mass-market, power-sensitive computer vision applications. This ambitious overarching aim will be achieved through the following objectives: i. Achieve the integration of high-performance wide-spectrum CMOS / TMDC / heavy-metal-free stack SWIR sensitive image sensors as demonstrated by imaging and electrical characterisation analysis. ii. Achieve a reduction of the total image sensor’s power consumption, enabled by a >1,000x decrease in the pixel engine power consumption. iii. Increase the investment readiness of QSTACK, as demonstrated by the number of early users interested in pilots and evaluation kits, together with the creation of investment material. QSTACK envisions putting the European semiconductor industry in an advantageous position to seize the opportunity in mass-market computer vision applications that will have an enormous impact on consumer electronics, personalised health, and safe mobility.
more_vert Open Access Mandate for Publications and Research data assignment_turned_in Project2023 - 2026Partners:ICFO, FI GROUP PORTUGAL, QURV TECHNOLOGIES SL, VW AG, Heidelberg University +2 partnersICFO,FI GROUP PORTUGAL,QURV TECHNOLOGIES SL,VW AG,Heidelberg University,IMEC,BLACK SEMICONDUCTOR GMBHFunder: European Commission Project Code: 101119489Overall Budget: 5,497,960 EURFunder Contribution: 5,497,960 EURFrom the late 1950s, Computer Vision (CV), a significant field of artificial intelligence (AI), began to be the tool to realize human intelligence and perception. Today, the global computer vision market has a value of over $11 billion and will reach $19 billion in 2027. Current computer vision systems suffer from high power consumption and limited reliability due to the low amount of information captured and sensor malfunction in adverse conditions such as fog, darkness, and bright sunlight. The 2DNEURALVISION project aims to develop the enabling photonic and electronic integrated circuit components for a novel low-power consumption, any weather, any light computer vision system. These components are a 2DM enhanced wide-spectrum image sensor and optical neural network with enabling 2DM components. Non-toxic materials and new waferscale, CMOS-compatible back-end-of-line integration processes for 2DMs will be developed to show compatibility with high-volume markets. The developments in the 2DNEURALVISION project will result in reliable (any weather, any light), low cost (1000x lower), low power consumption (30x lower), and small form factor (1000x lower) computer vision systems. This will have enormous societal impacts by enabling disruptive improvements in the automotive, AR/VR, service robotic, and mobile device sectors.
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