Powered by OpenAIRE graph

Found an issue? Give us feedback

downloadDownload

E450LMDAP

European 450mm Lithography and Metrology Development for Advanced Patterning

assignment_turned_inproject01 Oct 2014(Started)-01 Oct 2017(Ended)Closed

Funder: European CommissionProject code: 621280 Call for proposal: ENIAC-2013-2

Funded under: FP7 | SP1 | SP1-JTI

Detailed project information (CORDIS)

E450LMDAP

- Summary
- DMPs

Partners

SEGULA , BRNL , ASML (Netherlands) , ASMB , Jordan Valley Semiconductors (Israel) , ENTEGRIS SAS , VDL-ETG , NEWAYS TECHNOLOGIES , STM CROLLES , ASML-B , AMTC , TNO , Toppan Photomasks Germany GmbH , Recif Technologies (France) , Semilev , adixen , KLA , REDEN , COVENTOR SARL , TU Delft , ...

View all View all

Data Management Plans

Start a new DMP in Argos

Powered by OpenAIRE graph

Found an issue? Give us feedback

Select content type to embed

All Research products

arrow_drop_down

<script type="text/javascript">
<!--
document.write('<div id="oa_widget"></div>');
document.write('<script type="text/javascript" src="https://www.openaire.eu/index.php?option=com_openaire&view=widget&format=raw&projectId=corda_______::cc132044a00a10047570d7fa9e7cac58&type=result"></script>');
-->
</script>

For further information contact us at helpdesk@openaire.eu